DUKE UNIVERSITY

This proposal presents a plan to acquire a silicon deep reactive ion etching (DRIE) system to be installed and operated within the Shared Materials Instrumentation Facility (SMIF) at Duke University. The proposed system represents industry-leading DRIE processing system, capable of performing a wide range of silicon etches that include high etch rate etching (over 35µm/min), high aspect ratio etching (over 70:1), deep sub-micron feature etching in the nanometer scale, smooth sidewall etch (with roughness <20nm), minimal undercutting of siliconon- insulator (SOI) substrates, flexible sidewall profile control, and highly selective etching (selectivity over 240:1 to photoresist). Combined with the electron beam lithography and other cutting-edge fabrication capability already available in SMIF, this system will provide the current users of SMIF a unique opportunity for silicon patterning and integration at the nanoscale. With the addition of the proposed tool, the current users will be able to realize unique devices and integrated system solutions, including optical micro-electromechanical systems (MEMS), metamaterials at the micro- and nano-scale, photonic crystals and nanophotonic devices, micropower generators, precision packaging solutions for optical/electronic devices and systems, terahertz sources, microfluidic devices, and low-cost patterning technologies using molds and stamps. The diversity of research projects that this tool can immediately enable demonstrates the multidisciplinary impact that it will have on a highly collaborative research environment already established in SMIF at Duke University. Furthermore, the flexible silicon processing capability available on campus will be leveraged to create hands-on educational program consistent with the Integrated Sensing and Information Processing (ISIP) theme that was at the heart of the curriculum reform at the Electrical and Computer Engineering Department at Duke. The proposed system will be installed, operated and maintained within SMIF infrastructure. SMIF already has (1) full-time engineering staff that can support the user training, operation and maintenance of the equipment, (2) cost recovery mechanism through user fees that will provide the financial resources to service the equipment, and (3) scheduling software to manage equitable distribution of equipment time among users. This arrangement ensures a sustainable long-term operation of the tool, while providing access to a very wide range of interested users and guarantee the investment can serve as a regional resource. Broader Impacts: The current users of SMIF include researchers from several universities, government research agencies and non-profit institutions, as well as startup companies that cannot afford to operate their own fabrication facility. Addition of new capabilities to SMIF will (1) provide graduate students and postdoctoral researchers with opportunities to expand their research experience that will help train a higher quality work force, and (2) enable local startup companies to develop their core technology that will lead to job creation and economic growth: there are several companies that stand to immediately benefit from the availability of the silicon etching capability. The addition of such a versatile tool will stimulate the creation of new research programs and product ideas that leverage the capability. In this sense the equipment will serve as a collaborative focal point to channel these activities in the region. The PI and the ECE Department at Duke University plans to create new laboratory course that utilize the silicon fabrication process made available by the addition of the etching capability, which will provide the students with a hands-on fabrication experience. The PI, Co-PIs and the institution (Duke) have a successful track record of attracting and nurturing female and minority scientists and engineers, and will continue the efforts through this program.

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